Zhonghui Chen
Technology Manager, D1 Etch, Logic Technology Development at Intel Corporation | Portland, Oregon Metropolitan Area
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Zhonghui Chen is a seasoned etch expert at Intel Corporation, currently serving as an Individual Contributor in the D1 Backend (BE) Etch Area. With over 18 years of extensive experience in plasma etch technology development (TD), ramping, and high-volume manufacturing (HVM), Zhonghui has become a pivotal figure in advancing etch processes across all front-end (FE) and back-end (BE) segments, spanning from the 90nm node to the latest process technologies. His deep understanding of major etch equipment platforms, including CCP (Capacitively Coupled Plasma), ICP (Inductively Coupled Plasma), and ECR (Electron Cyclotron Resonance), positions him as a leader in the field.
In his current role, Zhonghui is spearheading the Etch Project for the Limited Time Development (LTD) Cost Reduction Program, which is poised to impact a staggering $1 billion in capital costs. His strategic approach not only emphasizes cost efficiency but also aligns with Intel's broader business objectives, showcasing his ability to influence stakeholders both within and outside the LTD etch organization. Additionally, as the FMEA Project Leader for the BE Etch Area, he has successfully enabled zero quality excursions, underscoring his commitment to quality management and operational excellence.
Zhonghui's contributions extend beyond project leadership; he is an integral member of the D1 Etch Safety Quality Team (SQAT), where he collaborates with cross-functional teams to enhance safety protocols and quality standards. His expertise in environmental engineering, characterization, and design of experiments further enriches his role, making him a valuable asset in the semiconductor industry. With a passion for teaching and mentoring, Zhonghui is dedicated to fostering a culture of continuous improvement and innovation within Intel's etch community.
Technology Manager, D1 Etch, Logic Technology Development at Intel Corporation in January 2022 to December 2024
Individual Contributor: Process and Equipment, D1 Etch, Logic Technology Development at Intel Corporation in July 2019 to December 2024
Manager, Module Engineer in D1C and D1D Etch, Logic Technology Development at Intel Corporation in January 2009 to January 2019
Epitaxy Scientist in Components Research at Intel Corporation in January 2008 to December 2008
Process Engineer in D2, California Technology Manufacturing at Intel Corporation in January 2005 to January 2007
Epitaxy Tenure-Track Assistant Professor at The City University of New York in August 2003 to September 2005
Epitaxy Research Assistant Professor at University of Southern California in January 1999 to August 2003
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The Julius Maximilians University of Würzburg, Doctor of Philosophy (Ph.D.), September 1995 to September 1999
Shanghai Institute of Technical Physics, Chinese Academy of Sciences, September 1991 to September 1995
Nanjing University, Bachelor's Degree, September 1987 to September 1991
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III-V semiconductor device processing
semiconductor optical spectroscopy
semiconductor structural characterization
semiconductor device electrical measurement
thin film chemical composition analysis
ferroelectric thin film structural and electrical characterization
semiconductor optical and structural characterization
III-V semiconductor epitaxy
III-V semiconductor processing
ultra-high vacuum equipment maintenance
Equipment Installation
Equipment Design
Vendor Partnerships
Epitaxy
JDP
Cross-functional Collaborations
Manufacturing
Thin Film Deposition
Manufacturing Process Improvement
Process Optimization (Manufacturing)
Manufacturing Engineering
Teaching
Quality Management
Cross-Functional Team Management
Environmental Policy
Environmental Engineering
Team Management
Research and Development (R&D)
Cost Reduction
Technology Development
Mass Production
Program Management
Semiconductors
Characterization
Physics
Thin Films
Design of Experiments
Materials Science
Nanotechnology
R&D
Semiconductor Industry
JMP
Plasma Etch
III-V Epitaxy
Oxide Epitaxy
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Discover more about Intel CorporationWhat is Zhonghui Chen email address?
Email Zhonghui Chen at [email protected] and [email protected]. This email is the most updated Zhonghui Chen's email found in 2026.
How to contact Zhonghui Chen?
To contact Zhonghui Chen send an email to [email protected] or [email protected]. (updated on August 25, 2024)
What company does Zhonghui Chen work for?
Zhonghui Chen works for Intel Corporation
What is Zhonghui Chen's role at Intel Corporation?
Zhonghui Chen is Technology Manager, D1 Etch, Logic Technology Development
What is Zhonghui Chen's Phone Number?
Zhonghui Chen's phone (503) ***-*295
What industry does Zhonghui Chen work in?
Zhonghui Chen works in the Semiconductors industry.
Zhonghui Chen Email Addresses
Zhonghui Chen Phone Numbers
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